磁控溅射CuCrMo薄膜耐126kV 20kA电弧烧蚀性能

126kV 20kA Arc Erosion Resistance of CuCrMo Film Prepared by Magnetron Sputtering

提升真空断路器CuCr触头的抗电弧烧蚀能力是决定其能否应用于高压真空灭弧室的核心关键,尚未见有效触头材料或表面涂层改性技术使CuCr触头应用于126kV以上真空灭弧室的报道。基于CuCrMo薄膜的优异电气性能,对沉积CuCrMo薄膜的真空灭弧室触头进行126kV下的抗电弧烧蚀研究,并进行开断寿命的工程验证。采用磁控溅射技术在CuCr50真空触头片表面沉积5μm厚的CuCrMo薄膜,对其进行126kV 20kA电流下23次的电寿命试验。利用XRD、SEM和3D共聚焦显微镜研究电弧烧蚀后表面形貌。研究结果表明:沉积CuCrMo薄膜的触头片,在纵向磁场和126kV 20kA条件下可有效分散电弧,较未镀膜触头片有更小电弧电流密度;经过23次电寿命试验后,表面烧蚀程度比未镀膜的触头片轻,表面粗糙度降低,提高了触头的开断寿命。为表面改性真空断路器CuCr触头在高电压大电流真空灭弧室的应用提供了有效工程依据。

Improving the arc ablation resistance of CuCr contact of vacuum circuit breaker is the core key to determine whether it can be applied to high-voltage vacuum interrupters.There are few effective contact materials or coating technology making CuCr contact being applied to vacuum interrupters above 126 kV.Based on the excellent electrical properties of CuCrMo film,the arc erosion resistance and breaking life of the vacuum interrupter contact deposited with CuCrMo film is studied at 126 kV and its engineering verification of breaking life is carried out.5μm CuCrMo film is deposited by magnetron sputtering on the surface of the CuCr50 contactors,and the electrical life experiment is conducted 23 times at 126 kV 20 kA current.The surface microstructure and topography after arc ablation is studied by X-ray diffraction(XRD),second electron microscopy(SEM)and 3D confocal laser scanning microscope.The results show that the CuCrMo coated contactor can effectively disperse the arc and reduce the arc current density under the condition of axial magnetic field and the 126kV 20kA current.After 23 times electric life experiment,the surface erosion is less than the contactor without coating,the surface roughness is reduced,and the life of the contactor is extended.This paper provides an effective engineering basis for the application of modified CuCr contact in high voltage and high current vacuum interrupter.