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The Characteristic of Threading Dislocation in Different Structures GaN Films Grown by MOCVD 被引量:1

The Characteristic of Threading Dislocation in Different Structures GaN Films Grown by MOCVD
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摘要 Three mechanisms to reduce threading dislocations(TDs) in GaN films as the epitaxial films grow thicker are suggested by SEM and Three mechanisms to reduce threading dislocations(TDs) in GaN films as the epitaxial films grow thicker are suggested by SEM and TEM
出处 《光学学报》 EI CAS CSCD 北大核心 2003年第S1期861-862,共2页 Acta Optica Sinica
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