摘要
利用DCArcPlasmaJetCVD法制备搀杂氮的金刚石厚膜。研究了在反应气体CH4 /Ar/H2 中加入N2 对金刚石膜显微组织和力学性能的影响。在固定H2 、Ar、CH4 流量的情况下改变N2 的流量 ,即反应气体中氮原子和碳原子的变化比例 (N/C比 ,范围从 0 0 6～ 0 6 8) ,同时在固定的腔体压力 (4kPa)和衬底温度 (80 0℃ )下进行金刚石膜生长。用扫描电镜 (SEM )观察金刚石膜形貌、用X射线衍射表征晶体取向 ,用三点弯曲的方法来测量金刚石膜的断裂强度。结果表明 ,氮气在反应气体中的大量加入 ,对直流等离子体喷射制备金刚石膜的显微组织和力学性能有显著的影响。
Nitrogen-doped diamond films were synthesized by DC arc plasma jet chemical vapor deposition using a CH_4/Ar/H_2 gas mixture.The effect of nitrogen addition into the feed gases on microstructure and mechanical properties of diamond film was investigated.The reactant gas at a constant flow rate of hydrogen and methane,the nitrogen to carbon ratios(N/C)were varied from 0.06 to 0.68.The films were grown under a constant pressure(4kPa)and a constant substrate temperature(1073K).The deposited films were characterized by scanning electron microscopy and X-ray diffraction.The fracture strength of diamond films was tested by three point bending method.The results show that nitrogen addition to CH_4/Ar/H_2 mixtures will lead to a significant change of the microstructure and mechanical properties of the free-standing diamond films prepared by DC arc plasma jet.
出处
《金属热处理》
CAS
CSCD
北大核心
2004年第5期1-5,共5页
Heat Treatment of Metals
基金
国家"8 63"计划项目 ( 2 2 0 2AA3 0 5 5 0 8)
北京科技大学专项发展基金 ( 2 0 0 2 0 42 4790 )
