直流电弧等离子体喷射化学气相沉积高质量金刚石膜残余应力分布的拉曼谱分析(英文)

Analysis of Residual Stress Distribution in DC Arc Plasma Jet CVD High Quality Diamond Films by Raman Spectroscopy

不同工艺条件下在钼衬底 (6 0mm)上用 10 0kW直流电弧等离子体喷射化学气相沉积设备进行金刚石膜的制备。金刚石膜用扫描电镜 (SEM)、拉曼谱 (激光激发波长为 4 88nm)和X射线衍射来表征。研究结果表明 ,在直流电弧等离子体喷射化学气相沉积金刚石膜的过程中 ,内应力大小从金刚石膜的中央到边缘是增加的 ,并且应力形式是压应力。这说明了在金刚石膜中存在明显的应力不均。甲烷浓度和衬底温度都影响金刚石膜中的内应力。随着甲烷浓度和衬底温度的提高 ,金刚石膜中的内应力呈增加的趋势。

Diamond films were deposited on molybdenum substrates (60mm) by a 100kW DC arc plasma jet CVD apparatus under different process parameters. The diamond films were characterized by scanning electron microscopy (SEM), Raman spectroscopy (laser excitation wavelength: 488 nm) and X-ray diffraction. The results show that in the process of DC arc plasma jet CVD diamond film deposition, the internal stress increases from the center to the edge, and the stress mode is compressive. This demonstrates a significant inhomogeneity of stress in diamond films. Both methane concentration and substrate temperature influence the internal stress in diamond films. The trend is that internal stress increases with the increase of methane concentration and substrate temperature.