期刊文献+

高质量金刚石自支撑膜织构与断裂强度的关系研究 被引量:2

Research on Relationship Between the Texture and Fracture Strength of High Quality Freestanding CVD Diamond Films
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摘要 利用直流电弧等离子体喷射化学气相沉积在Mo基体上制备了不同织构的金刚石厚膜。用扫描电境(SEM)观察金刚石膜的形貌,用XRD表征晶体取向,用极图和取向分布函数法计算金刚石膜的不同织构,利用三点弯曲法测量金刚石膜的断裂强度。结果表明,金刚石膜的断裂强度随着衍射峰强度比值I(111)/I(220)的增大而不断降低。{110}织构的金刚石膜具有最高的断裂强度。 The different textured CVD diamond films on molybdenum substrate were prepared by DC arc plasma jet system.The morphology of diamond films was observed by SEM and crystal orientations were characterized by XRD.The different textures of CVD diamond films were analyzed using the methods of pole figure and orientation distribution function.The fracture strength of the diamond films was tested by three-point bending method.The results show that the relationship between texture and fracture strength of CVD diamond films was obtained.With the increase of ratio of diffraction peak intensity I_ (111)/I_ (220),the value of fracture strength decreases,and the {110} textured diamond films have the highest fracture strength.
出处 《金属热处理》 EI CAS CSCD 北大核心 2005年第6期2-5,共4页 Heat Treatment of Metals
基金 国家"863"十五攻关项目(2202AA305508) 自然科学基金项目(50372007)
关键词 金刚石膜 自支撑 织构 断裂强度 diamond films freestanding texture fracture strength
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参考文献9

  • 1Kamiya S,Takahashi H, Kobayashi A, et al. Fracture strength of chemically vapor deposited diamond on the substrate and its relation to the crystalline structure [J]. Diamond and Related Materials ,2000,9( 3-6 ) : 1110-1114.
  • 2Bartsch K,Waidmann S, Arnold B, et al. Deposition of undoped and doped textured diamond layers [J]. Thin Solid Films ,2000,377-378 : 188-192.
  • 3Yang J X, Zhang H D, Li C M,et al. Effects of nitrogen addition on morphology and mechanical property of DC arc plasma jet CVD diamond films [J]. Diamond and Related Materials, 2004,13(1):139-144.
  • 4杨胶溪,张恒大,李成明,陈广超,吕反修,唐伟忠,佟玉梅.加氮对直流电弧等离子体喷射金刚石膜生长、形貌和质量的影响[J].人工晶体学报,2003,32(4):386-392. 被引量:2
  • 5杨胶溪,李成明,陈广超,苗晋琦,宋建华,吕反修,唐伟忠,佟玉梅.加氮对直流电弧等离子体喷射金刚石膜显微组织和断裂强度的影响[J].金属热处理,2004,29(5):1-5. 被引量:1
  • 6Bunge H J. General Outline and Seriea Expansion Method.In:Bunge H J. and Esling C eds. Quatitative Texture Analysis [M]. Oberursel : DGM-Informationsgesellschaft, 1981.
  • 7Wild Ch, Herres N, Koidi P. Texture Formation in Polycrystalline Diamond Films [J]. J. Appl. Phys.,1990,68:973.
  • 8Fayette L, Mermoux M, Marcus B, et al. Analysis of the fine structure of the raman and X-ray reflection profiles for textured CVD diamond films [J]. Diamond and Related Materials, 1995,4(11):1243-1250.
  • 9毛卫民,张弘.大规模集成电路导电薄膜的织构效应[J].北京科技大学学报,2000,22(6):539-542. 被引量:8

二级参考文献27

  • 1毛卫民 张新明.晶体材料织构定量分析[M].北京:冶金工业出版社,1985.89,210.
  • 2Asmussen J, Mossbrucker J, Khatami S, Huang W S, Wright B, Ayres V. The Effect of Nitrogen on the Growth, Morphology and Crytalline Quality of MPACVD Diamond Films[J]. Diamond and Related Materials, 1999,8: 220-225.
  • 3Corrigan T D, Gruen D M, Krauss A R, Zapol P, Chang R P H. The Effect of Nitrogen Addition to Ar/CH4 plasmas on the Growth, Morphology and Field Emission of Ultrananocrystalline Diamond [J]. Diamond and Relat Mater ,2002, 11: 43-48.
  • 4Stiegler J, Bergmaier A, Michler J, Laufer S, Dolliger G, Blank E. The Effect of Nitrogen on Low Temperature Growth of Diamond Films[j]. Thin Solid Films, 1999, 352: 29-40.
  • 5Ahmed W, Rego C A, Cherry R, Afzal A, Ali N, Hassan I U. CVD Diamond: Controlling Structure and Morphology[J]. Vacuum, 2000,56:153-158.
  • 6Vandevelde T, Nesladek M, Quacyhaegens C, Stats L. Optical Emission Spectroscopy of the Plasma during CVD Diamond Growth with Nitrogen Additlon[J]. Thin Solid Films,1996, 290-291: 143-147.
  • 7Vandevelde T, Nealadek M, Quaeyhaegem C, Stals L. Optical Emission Spectroscopy of the plasma during Microwave CVD of Diamond Thin Films with Nitrogen Addition and Relation to the Thin Film Morphology[J]. Thin Solid Films, 1997, 308-309: 154-158.
  • 8Tsao-Ming Heng, Sheng-Hsiung Chen, et al. Effect of Nitrogen on Diamond Growth using Unconventional Gas Mixtures[ J]. Thin Solid Films, 1995,270: 148-153.
  • 9Yu Z, Karlsson U, Flodstrom A. Influence of Oxygen and Nitrogen on the Growth of Hot-filament Chemical Vapor Deposited Diamond Films[J].Thin Solid Films, 1999, 342: 74-82.
  • 10Stiegler J, Lang T, Nygard-Ferguson M,Von Kaenel Y, Blank E. Low Temperature Limits of Diamond Film Growth by Microwave Phasma-assisted CVD[J]. Diamond and Related Materials,1996, 5 : 226-230.

共引文献8

同被引文献22

  • 1吕反修.超硬材料薄膜涂层研究进展及应用[J].热处理,2004,19(4):1-6. 被引量:11
  • 2廖克俊,王万录.直流等离子体CVD法合成的金刚石膜的断裂强度研究[J].物理学报,1994,43(9):1559-1563. 被引量:4
  • 3陈荣发,左敦稳,李多生,相炳坤,赵礼刚,王珉.甲烷浓度对等离子喷射金刚石厚膜生长稳定性的影响[J].金属学报,2005,41(10):1091-1094. 被引量:6
  • 4Davies A R,Field J E,Takahashi K,et al. Tensile and fatigue strength of free-standing CVD diamond[J]. Diamond and Related Materials, 2005,14 : 6-10.
  • 5Lu F X,Y L,Zhong G F,et al. Fracture behavior of thick diamond films prepared by DC arc plasma jet method[J]. Diamond and Related Materials, 1998,7 : 733-736.
  • 6Lu F X, Liu J M,Chen G C et al. Oxidation behavior of high quality freestanding diamond films by high power arc jet operating at gas recycling mode[J]. Diamond and Related Materials, 2004,13 : 533-538.
  • 7Yang Q Q,Chen B J,Wang X Q,et al.A study of the microstructure and properties of diamond film.Vacuum,1995,46(2):185
  • 8Klein C A.Diamond windows and domes:flexural strength and thermal shock.Diamond Related Mater,2002,11(2):218
  • 9Lu F X,Tang W Z,Zhong G F,et al.Economical deposition of a large area of high quality diamond film by a high power DC arc plasma jet operating in a gas recycling mode.Diamond Related Mater,2000,9(9/10):1659
  • 10张恒大.杂质以及对CVD自支撑金刚石膜性能的影响[学位论文].北京:北京科技大学,2003

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