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Ar离子注入YIG单晶薄膜的磁光特性

Magneto-Optlcal Properties of Ar Ion- implanted YIG Film
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摘要 利用离子注入技术将Ar离子注入到YIG单晶薄膜中,剂量为(10 ̄(12)~10 ̄(14))ions/cm ̄2,能量为600keV。分别测量注入前后及退火后的样品的光吸收谱、法拉第旋转和拆射率,发现对样品实施退火,可有效地降低光损耗,增加法拉第旋转,调节薄膜折射率。 The ions were implanted into YIG film with dose of(10 ̄(12)~10 ̄(14))ions/cm ̄2 at an en-ergy of 600keV. The optical absorption spectrum. Faraday rotation,and refractive index were mea-sured for no- implanted,as-implanted and annealing samples.The results show that,by annealing the optlcal absorption resulting from implantation can be decreased;Faraday rotation can be in-creased;the refractive index of film can be adjusted.
出处 《压电与声光》 CSCD 北大核心 1995年第2期30-31,35,共3页 Piezoelectrics & Acoustooptics
关键词 磁光薄膜 离子注入 磁光特性 钇铁石榴石 magneto-optical film,ion-implantation,magneto-optical property
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