摘要
从等离子体发射光谱变化这一角度研究在不同沉积条件下等离子体中电子平均能量的特点,分析碳源气体分子与电子的碰撞以及碳氢基团的能态变化,从而对等离子体法沉积金刚石薄膜微观机理进行初步的探索。
The charactor of the average energy of the electrons in the plasma ballgenerated by microwaves is studied by observing the spectrum of the plasma ballunder different depositing conditions.The mechanism of deposition is discussedby analyzing the collisions between electrons and hydrocarbon molecules and thechange of the hydrocarbon radicals' energy.
出处
《应用科学学报》
CAS
CSCD
1995年第1期35-38,共4页
Journal of Applied Sciences
关键词
等离子体
光谱
金刚石
薄膜
沉积
diamond film plasma spectrum,average energy of electrons.