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射频磁控溅射法生长Mg_xZn_(1-x)O薄膜的结构和光学特性 被引量:1

Structural and optical properties of Mg_xZn_(1-x)O thin films deposited by radio frequency magnetron sputtering
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摘要 用射频磁控溅射法在80℃的衬底温度下制备出MgxZn1-xO(0≤x≤0.30)薄膜.x射线衍射(XRD)结果表明,MgxZn1-xO薄膜为单相六角纤锌矿结构,没有形成任何显著的MgO分离相,MgxZn1-xO薄膜的择优取向平行于与衬底垂直的c轴;c轴晶格常数随着Mg含量的增加逐渐减小.在MgxZn1-xO薄膜的光透射谱中出现锐利的吸收边,由透射谱估算出MgxZn1-xO薄膜的带隙宽度由3.32eV(x=0)线性地增加到3.96eV(x=0.30). MgxZn1-xO films(0≤x≤0.30) have been prepared on sapphire substrates by radio frequency magnetron sputtering at a substrate temperature of 80℃ . Optical and structural properties of the MgxZn1-xO films were studied using transmittance and x- ray diffraction (XRD)spectra. XRD patterns indicate that the MgxZn1-xO films have hexagonal wurtzite single-phase structure of ZnO and a preferred orientation with the c-axis perpendicular to the substrates without any significant formation of a separated MgO phase. The c-axis lattice constant of the MgxZn1-xO films decreases gradually with increasing Mg content. Sharp absorption edge appeared in the transmittance spectra of the MgxZn1-xO films, the fundamental band gap of the MgxZn1-xO films were estimated, which increases almost linearly from 3.32 eV at x = 0 to 3.96 eV at x = 0.30.
出处 《物理学报》 SCIE EI CAS CSCD 北大核心 2005年第9期4309-4312,共4页 Acta Physica Sinica
基金 教育部博士点基金(批准号:20020422056)资助的课题.~~
关键词 MgxZn1-xO薄膜 射频磁控溅射 Mg含量 纤锌矿结构 薄膜 光学特性 生长 衬底温度 光透射谱 X射线衍射 择优取向 MgxZn1-xO thin films, radio frequency magnetron sputtering, Mg contents
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