摘要
对聚焦离子束加工技术在集成电路芯片的诊断与修改、修复光刻掩模缺陷、制作透射电镜样品以及多用途微切割上的应用作了详细介绍。
The applications of focused ion beam technology, for example, diagnose and modification of IC CMOS chip, repair of mask defect, making samples of TEM, multi-useful tool for tiny cut and so on, were introduced in details.
出处
《微纳电子技术》
CAS
2005年第12期575-577,582,共4页
Micronanoelectronic Technology
关键词
聚焦离子柬
液态金属离子源
应用
focused ion beam （FIB）
liquid metal ion source
application
