摘要
提出了高精密设备光刻机模拟工作平台隔振系统的设计方法和系统结构;根据国内外现行的减振方法,建立了整个模拟工作台的结构模型;根据减振要求,选择了适当的减振器。由于光刻机所处激励环境的复杂性和系统内部存在的非线性,采用了主动控制方法BP神经网络+PID控制的主动控制方法来控制整个减振系统。
The paper puts up the design method and system structure of the precision vibration reduction system for the simulated Working Stage of lithography and establishes the whole structure model of the vibration isolation based on lots of vibration reduction methods. According to vibration reduction requirements, the paper also chooses a set of vibration reduction equipment. Because of the complexities of the working environment of lithography and nonlinear features in the system, the approach of BP neural network + PID controller is put forward to control the whole vibration reduction system.
出处
《制造技术与机床》
CSCD
北大核心
2005年第12期23-26,共4页
Manufacturing Technology & Machine Tool
基金
国家自然科学基金委项目重大项目(课题编号:50390064)
上海市科委联合资助项目<精密机械减振隔振技术研究>