摘要
介绍了国内外立方氮化硼薄膜的制备技术、性质表征、生长机制及其应用等研究的新进展,并展望了它的发展前景。
In this paper,we have reviewed the recent developments of cubic boron nitride films in the deposition methods,properties characterization,growth mechanism and the applications,and also looked into the future of the development.
出处
《真空科学与技术》
CSCD
1995年第6期407-414,共8页
Vacuum Science and Technology