摘要
介绍一种大功率直流溅射恒流电源的设计。该设计解决了溅射过程中的打火及电流不易控制的问题。经实用证明，该设计达到了预期的效果。
The design of a DC sputtering power source was presented. Experiments show that the sparking and current fluctuation during the sputtering processing were effectively depressed with this source.
出处
《红外技术》
CSCD
1996年第6期31-32,共2页
Infrared Technology
关键词
直流溅射
恒流源
电源
设计
DC sputtering, DC sputtering power source, Constant current source
