酸性低温脉冲化学镀镍磷合金的性能

The Performances of Acid Electroless Plated Nickel-Phosphorus Alloy with Pulse Current at Low Temperature

介绍了低温脉冲化学镀镍的研究工作。结果表明：由于电脉冲的催化作用，使得酸性化学镀镍的施镀温度降低至５０℃时，仍具有１１μｍ／ｈ的沉积速度，镀层磷含量达１０．４８ｗｔ％，结构组织仍为非晶态。其镀层的性能与８０℃施镀的化学镀镀层性能相当。

Study of nichel acid electroless plating with pulse current at low temperature is reported in this paper. The results show that because of the catalytic effect of electric pulse, the operating temperature of nickel acid electroless plating can be lowered to 50℃ with deposition rate of 11μm/h and about 10.48wt%phosphorus.Its structure is amorphous. The properties of coating obtained at 50℃ with pulse current is equivalent to that of coating obtained at 80℃ without pulse current.