摘要
本文给出了硅表面覆盖氧化层时，场发射电流的解析公式．考虑了固定氧化物电行时场致发射的影响．结果表明，氧化物和固定电荷均使场发射电流减小，场发射Ｆｏｗｌｅｒ－Ｎｏｒｄｈｅｉｍ图中有两个明显的线性区．
Abstract Taking into account the fixed charge within the oxide, an analytical formula for field emission from the oxide-covered silicon is presented. The results show that both the oxide film and the fixed charge reduce the field; emission current. The Oxide films over about 1nm in thickness result in the two-distinct linear regions in Fowler-Nordheim plot.
基金
国家自然科学基金
国防科技预研基金
