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磁流变抛光装置中的磁路和磁屏蔽设计 被引量:5

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摘要 利用磁流变抛光(MRF)技术对光学零件进行加工是一项极具前景的超精密加工技术。在论述磁流变抛光基本原理的基础上,详细讨论了该装置设计过程中的磁路设计,使抛光区产生足够的磁场强度;同时分析和验证了磁流体循环系统中的磁屏蔽技术设计。这些方法对磁流变抛光装置的工程应用有很好的参考价值。
出处 《机械制造》 2008年第11期32-33,共2页 Machinery
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