原子层淀积Al_2O_3薄膜表面自组装Au纳米颗粒及其热稳定性

Self-assembly growth and thermal stability of Au nano-particles on atomic-layer-deposited Al_2O_3 film

在原子层淀积的Al_2O_3薄膜表面自组装生长Au纳米颗粒,研究了Au纳米颗粒的自组装过程和热稳定性.结果表明,原子层淀积的Al_2O_3薄膜表面很容易吸附氨丙基三甲基硅烷(APTMS),有利于Au纳米颗粒的自组装,生长出的Au纳米颗粒尺寸为5—8 nm,密度约为4×10^(11)cm^(-2).在300℃氮气中退火使Au纳米颗粒的尺寸增大,但是没有改变APTMS的吸附状态和Au的化学组成.当退火温度提高到450℃时,Au纳米颗粒发生明显的团聚,且分布变得极不均匀.

The self-assembly growth of Au nano-particles on atomic-layer-deposited （ALD） Al2O3 thin film has been achieved. And the self-assembly process and the thermal stability have been investigated. The results show that the ALD Al2O3 film is inclined to adsorb （3-Aminopropyl）-trimethoxysilane （APTMS）, which is in favor of self-assembly growth of Au nano-particles. The resulting Au nano-particles are mainly in the range of 5-8 nm with a density of nearly 4×10^11cm^-2. The annealing at 300 ℃ in N2 leads to an increase in the dimension of Au nano-particles, however, the good adsorption of APTMS and the chemical compositions of Au nano-particles are maintained. When the annealing temperature elevates to 450 ℃, Au nano-particles exhibit severe agglomeration together with extreme nonuniformilty.