摘要
基于固着磨料加工碳化硅反射镜的微观作用原理,从理论上定量分析了金刚石磨料压入碳化硅工件的深度对材料去除率、光学元件表面粗糙度的影响,分别获得了材料去除率数学模型及粗糙度的仿真计算结果。实验与理论模型的对比结果表明:去除率实验值与理论值走势相同并稳定在同一数量级内;粗糙度实验所使用的W1.5,W3.5,W5等丸片获得的粗糙度理论值与实验偏差分别为5.97%,3.19%,3.59%,由此验证了理论分析的正确性。
Based on micro-interaction principle of fabricating SiC material with fixed abrasive, this pa per quantitatively discussed the influence of depth of diamond abrasive formed in SiC workpiece on the material removal rate and surface roughness of optical component. The mathematical model of material removal rate and the simulation results of surface roughness were obtained, respectively. By comparison of experimental results with theory in material removal rate and surface roughness, the trend of theoretical and experimental results are basically the same and the values of results are maintained in the same quantitative level; The difference of roughness of pellets W1. 5, W3.5, W5 in experiment and theory are 5.97%, 3.19%, 3.59%, respectively, which can validate the correctness of theory analysis.
出处
《光学精密工程》
EI
CAS
CSCD
北大核心
2009年第3期513-518,共6页
Optics and Precision Engineering
基金
中国科学院长春光学精密机械与物理研究所三期创新工程资助项目
关键词
碳化硅反射镜
固着磨料
丸片
去除率
粗糙度
SiC mirror
fixed abrasive
pellet
removal rate
surface roughness