摘要
采用多弧离子镀技术,使用Ti-AI-Zr合金靶和Cr靶,在W18Cr4V高速钢基体上沉积(Ti,Al,Zr,Cr)N多组元氮化物膜。利用扫描电镜(SEM)、电子能谱仪(EDS)和X射线衍射(XRD)对薄膜的成分、结构和微观组织进行测量和表征;利用划痕仪、显微硬度计测评薄膜的力学性能。结果表明,获得的多组元氮化物膜仍具有B1-NaCl型的TiN面心立方结构;薄膜的成分除-50V偏压外,其它偏压下的变化均不明显;增大偏压可减少薄膜表面的液滴污染,提高薄膜的显微硬度及膜/基结合力,最高值可分别达到HV3300和190N。
The multi-component (Ti, M, Zr, Cr) N coatings were deposited by multi-am ion plating on high speed steel substrates(W18Cr4V).The mierostructures and mechanical properties of the coatings were characterized with X-ray diffraction (XRD), X-ray energy dispersion spectroscopy (EDS), scanning electron microscopy (SEM) and conventional surface probes. The impacts of the coating growth conditions on its microstructures and properties were studied. The results show that the TiN(Bl-NaCl) face-centered cubic phase exists in the multi-component (Ti, Al, Zr, Cr) N coatings, and that the bias voltage, except - 50V, little affects its stoichiometries. Interesting finding is that an increase of the bias reduces the surface wettability of some liquids, and enhances its micro-hardness and adhesion at the film/substrate interface up to 3300HV and 190N, respectively.
出处
《真空科学与技术学报》
EI
CAS
CSCD
北大核心
2009年第6期707-711,共5页
Chinese Journal of Vacuum Science and Technology
基金
辽宁省高等学校优秀人才支持计划资助项目(No.RC-05-05)
长江学者和创新团队发展计划资助(No.IRT0713)
关键词
无机非金属材料
多弧离子镀
TiN基硬质膜
高速钢
偏压
Inorganic non-metallic materials,Multi-arc ion plating,TiN base hard film,High speed steel,Bias voltage