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载气对气相沉积BN膜的形成及摩擦学性能的影响研究

Effects of Carrier Gas on the Formation and Tribological Performance of BN Films Deposited by PCVD
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摘要 以Ar+10%H2(体积分数计)、H2及N2为载气,采用射频PCVD技术在40Cr钢表面制备了BN膜;对沉积BN膜进行了FTIR、TEM和SEM等分析;并对不同载气下膜与基体的结合力、膜层残余应力、硬度及耐磨性进行了比较.结果表明,BN膜中c-BN含量分别为58.1%、27.7%和27.4%,膜厚分别为4.6μm、2.0μm和3.3μm. Boron nitride (BN) films were deposited by plasma assisted CVD technique, using nitrogen (N 2), hydrogen (H 2) or vol. 10% H 2 diluted in argon (Ar) as carrier gas. It was found by FTIR and SEM analyses that of the three carrier gases, the c BN content was the highest for Ar + 10% H 2. The deposition rate was very low with H 2 carrier gas. The bonding strength of the film determined by indentation test was the lowest with N 2 carrier gas. TEM analysis indicates that the films composed were of amorphous and cubic BN phases, with the size of c BN particles in the range of 20 ̄40 nm. The residual stress, hardness, and antiwear properties of the films have also been investigated and compared with eath other.
出处 《摩擦学学报》 EI CAS CSCD 北大核心 1999年第2期117-121,共5页 Tribology
基金 国家863攻关课题
关键词 c-BN膜 PCVD 载气 摩擦学性能 c BN films PCVD carrier gas tribological properties
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  • 1Lai F D,Surf Coat Technol,1996年,88卷,183页
  • 2Su Y L,Wear,1996年,199卷,132页

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