摘要
The characteristics of nitrided layers prepared on commercially pure titanium substrates by direct current nitrogen arc are presented by scanning electron microscopy （SEM） and transmission electron microscopy （TEM） micrographs as well as X-ray diffraction （ XRD ）. The titanium nitride （ TiN ） dendrites were fully developed with interconnected cellular morphologies at the top surface but grew almost perpendicular to the integrace with coarser arms in the middle area. Also less TiN was found near the interface. The energy inputs had an obvious effect on the microstructures and the hardness of the nitrided layers. The maximum micro-hardness was 2 500 HV at the top surface which was over 9 times higher than that of the substrate.
The characteristics of nitrided layers prepared on commercially pure titanium substrates by direct current nitrogen arc are presented by scanning electron microscopy （SEM） and transmission electron microscopy （TEM） micrographs as well as X-ray diffraction （ XRD ）. The titanium nitride （ TiN ） dendrites were fully developed with interconnected cellular morphologies at the top surface but grew almost perpendicular to the integrace with coarser arms in the middle area. Also less TiN was found near the interface. The energy inputs had an obvious effect on the microstructures and the hardness of the nitrided layers. The maximum micro-hardness was 2 500 HV at the top surface which was over 9 times higher than that of the substrate.
