期刊文献+

Yield strength of attached copper film

Yield strength of attached copper film
下载PDF
导出
摘要 Variation of stress in attached copper film with an applied strain is measured by X-ray diffraction combined with a four-point bending method. A lower slope of the initial elastic segment of the curve of X-ray measured stress versus applied strain results from incomplete elastic strain transferred from the substrate to the film due to insufficiently strong interface cohesion. So the slope of the initial elastic segment of the X-ray stress (or X-ray strain directly) of the film against the substrate applied strain may be used to measure the film-substrate cohesive strength. The yield strength of the attached copper film is much higher than that of the bulk material and varies linearly with the inverse of the film thickness. Variation of stress in attached copper film with an applied strain is measured by X-ray diffraction combined with a four-point bending method. A lower slope of the initial elastic segment of the curve of X-ray measured stress versus applied strain results from incomplete elastic strain transferred from the substrate to the film due to insufficiently strong interface cohesion. So the slope of the initial elastic segment of the X-ray stress (or X-ray strain directly) of the film against the substrate applied strain may be used to measure the film-substrate cohesive strength. The yield strength of the attached copper film is much higher than that of the bulk material and varies linearly with the inverse of the film thickness.
作者 张研 张建民
出处 《Chinese Physics B》 SCIE EI CAS CSCD 2011年第8期312-316,共5页 中国物理B(英文版)
基金 Project supported by the State Key Development Program for Basic Research of China (Grant No. 2004CB619302) the National Natural Science Foundation of China (Grant No. 51071098)
关键词 copper film yield strength X-ray diffraction copper film, yield strength, X-ray diffraction
  • 相关文献

参考文献21

  • 1Muraxka S P 1997 Mater. Sci. Eng. R 19 87.
  • 2Vinci R P, Marieb T N and Bravman J C 1993 Mater. Res. Soc. Symp. Proc. 308 297.
  • 3Bφrgesen P, Lee J K, Gleixner R and Li C Y 1992 Appl. Phys. Lett. 60 1706.
  • 4Gerth D, Katzer D and Schwarzer R 1992 Mater. Sci. Forum. 94 557.
  • 5Wang Y G, Chen D P, He H L, Wang L L and Jing F Q 2006 Acta Phys. Sin. 55 4202 (in Chinese).
  • 6Hu J B, Tan H, Yu Y Y, Dai C D and Ran X W 2008 Acta Phys. Sin. 57 405 (in Chinese).
  • 7Ruud J A, Josell D and Spaepen F 1993 J. Mater. Res. 8 112.
  • 8Reed D T and Dally J W 1993 J. Mater. Res. 8 1542.
  • 9Griffin A J, Brotzen F R and Dunn C F 1987 Thin Solid Films 150 237.
  • 10Doerner M F, Gardner D S and Nix W D 1986 J. Mater. Res. 1 845.

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部