磁控溅射Fe-N薄膜的结构和性能

STRUCTURE AND MAGNETIC PROPERLIES OF Fe-N FILMS PREPARED BY MAGNETRON SPUTTERING

研究了氮流量对磁控溅射Ｆｅ－Ｎ薄膜的磁性和结构的影响．加氮薄膜的软磁性能明显优于纯铁的．当氮的流量为１．０ｍＬ·ｍｉｎ^（－１）时，矫顽力 Ｈ_ｃ达到最小值２０５Ａ／ｍ．当氮流量为０．８ｍＬ·ｍｉｎ_（－１）时，饱和磁化强度达到Ｍ_ｓ＝２．３６Ｔ．在 Ｆｅ－Ｎ薄膜中未发现γ’－Ｆｅ４Ｎ和 α”－Ｆｅ１６Ｎ２．

The changes of soft magnetic properties and structure with nitrogen flow rate for Fe-N films prepared by magnetron sputtering on Si(111) substrates at room temperature have been investigated. The soft magnetic properties of films incorporated with nitrogen are better than these of pure iron film. The lowest coercivity (Hc=205A/m) is obtained at nitrogen flow rate of 1.0 mL.min-1, and the highest saturation magnetization (Ms=2.36T) at 0.8mL.min-1. Only α-Fe nitrogen solid solution was found in the Fe-N films and α'-Fe16N２ or γ'-Fe4N phase was not found in this study.