原子力显微扫描云纹法的相移技术研究

A study on the phase shifting technique for the AFM scanning moiré method

提出一种原子力显微镜扫描云纹法的相移新技术 ,运用原子力显微镜的压电扫描头作为相移元件 ,对所得云纹图像可进行 0 - 2 π范围内的四步相移。对该方法的测量原理和实验技术进行了详细的阐述。作为典型实验和应用实例 ,分别对由全息光栅和含热变形的电子封装试件栅形成的云纹进行相移分析。成功的实验结果表明 ,该方法是可行的 ,为微米云纹方法的条纹处理提供了一种新途径。

A new phase shifting technique for atomic force microscope (AFM) scanning moiré method is proposed The phase shifting was realized in four steps from 0 to 2π by a piezo scanner in AFM The measurement method and experimental techniques are described in detail This method is applied to determine the phase distribution in AFM moiré formed by a 1200 lines/mm holographic grating and deformed grating in a QFP electronic package