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半导体电子气体常用配置及消防要素 被引量:2

The General Location and the Element of Fire protection for the Electronic Gases in Semiconductor Fabrication
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摘要 根据集成电路晶片生产的实践 ,介绍一种半导体电子气体常用配置方式 ;并依照环保及安全的要求 。
作者 陈毅功
出处 《电子工业专用设备》 2001年第4期48-51,共4页 Equipment for Electronic Products Manufacturing
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  • 1孙福楠,韩美,王秋娥,梁玉,林刚,陈晓惠,田波.中国特种气体的现状及发展走向[J].低温与特气,2005,23(1):1-4. 被引量:8
  • 2Inazawa K, Okamoto S, Hayashi H, et al. Plasma etching method : US, 5595627 [ P]. 1997 - 01 - 21.
  • 3Ohno H, Sakai Y J, Shibuya T. Azeotropic mixture of flu- oromethane and hydrogen chloride and process for purifying fluoromethane :WO, 2005009933 [ P]. 2005 - 02 - 03.
  • 4Corbin D R, Fernandez R E, Mahler B A. Purification of hexafluoroethane products : US, 5523499 [ P]. 1996 - 06 - 04.
  • 5Ohno H, Nakajo T, Ohi T, et al. Method for purifying hexafluoroethane : US, 6274782 [ P]. 2001 - 08 - 14.
  • 6Ji W C,Shen D M, Jain R, et al. Method of processing semiconductor manufacturing exhaust gases : US, 6017382 [P].2000 -01 -25.
  • 7Succi M, Solcia C. Process for the purification of fluorine - containing gases : EP, 0501933 [ P]. 1992 - 09 - 02.
  • 8Gumprecht W H. Removal of carbon monoxide from perflu- oroalkanes : EP, 0128506 [ P ]. 1987.
  • 9Ohno H, Nakajo T. Purification of tetrafluoromethane : JP, 08081399 [P]. 1996-03-26.
  • 10Tamhankar S S, Bulow M, Ramachandran R, et al. Puri- fication of gas streams: EP, 0744210 [ P]. 1996 - 11 - 27.

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