摘要
采用射频磁控溅射技术在不锈钢基底上制备NiCr金属薄膜,研究不同的氩气压强对样品形貌和光学、附着力性能的影响。结果表明:所制备的NiCr薄膜在中远红外区都具有较高的反射率,平均值约为0.92,附着力级别均能达到5B;氩气压强对薄膜的性能具有较大的影响,具体表现为:随着压强的增大,薄膜的结晶度先上升后下降,均匀性先变好后变坏,在压强为4Pa时薄膜质量最好。
The NiCr thin films were deposited hy RF magnetron sputtering at room temperature on stainless steel substrate. The morphology, photo properties and adhesive force of the NiCr films were investigated. The results show that all NiCr films are higher reflectivity and the average value is about 0. 92 and the adhesive force of all films is 5B. With the pressure from 3 to 7 Pa, the degree of crystalline and homogeneity of the films increase and then decrease. At 4 Pa, the quality of the film was best.
基金
广东省教育部产学研结合项目(2012B091000111)
广东省科技计划项目(2014A010106014)
中央高校基本科研业务费专项基金(21612412)
暨南大学挑战杯项目(141213045)
关键词
射频磁控溅射
NiCr薄膜
不锈钢衬底
氩气压强
RF magnetron sputtering, NiCr films, stainless steel substrate, argon pressure
