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MPCVD金刚石膜装置的研究进展 被引量:2

THE DEVELOPMENT OF MICROWAVE PLASMA CHEMICAL VOPOR DEPOSITION FACILITIES FOR DIAMOND FILMS
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摘要 微波等离子体(MPCVD)法因其独特的优势,成为高速、大面积、高质量制备金刚石膜的首选方法,MPCVD金刚石膜装置的研究受到科研人员和工业界的广泛关注。文章对金刚石膜的性质和各种制备方法进行了简要概述,论述了CVD金刚石膜的生长机理,着重阐述了各种MPCVD装置的结构特点及工作原理,并对各种装置的优、缺点进行了分析。研究结果表明:研制具有高品质因数谐振腔能激发均匀微波等离子体的MPCVD装置,是进一步开发金刚石膜工业化应用所需解决的主要问题。 Microwave Plasma CVD(MPCVD)is one of the promising method for high growth rate,high quality, and large area diamond films deposition,and the research of the MPCVD device have received extensive attention of the researchers and industry. The properties and different preparation methods of diamond films were briefly summarized,the growth mechanism of CVD diamond films was discussed at the same time in the paper. The structure characteristics and working principle of various kinds of MPCVD device were emphatically elaborated,meanwhile,the advantages and disad-vantages of all this kinds of devices were analyzed. The results show that:development of MPCVD device which has the high quality factor of resonance cavity and the uniform microwave plasma is the main problem of diamond films in indus-trial application.
出处 《真空与低温》 2016年第3期132-137,共6页 Vacuum and Cryogenics
基金 湖北省教育厅项目(Q20151517)
关键词 金刚石膜 MPCVD 谐振腔 diamond films MPCVD resonance cavity
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参考文献22

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