半导体制冷技术在熔融沉积快速成型工艺中的应用及开发

Application and Development of Semiconductor Refrigeration Technology in Fused Deposition Modeling Rapid Prototyping

对半导体制冷技术和快速成型技术做了简要的说明和分析;对熔融沉积型快速成型工艺精度的影响因素进行了归纳和分析;展示了其应用案例,展望了其发展前景。

The semiconductor refrigeration technology and rapid prototyping technology were illustrated and analyzed briefly. The factors affecting the prision of fused deposition modeling rapid prototyping were summarized and analyzed. An application was shown, and its prospect was forecasted.