直流溅射法制备SnO_2纳米颗粒的机理及工艺研究

Process and mechanism of SnO_2 nanoparticles prepared by DC sputtering

采用直流溅射法成功制备出了SnO_2纳米颗粒,分析了SnO_2纳米颗粒的形成机理,研究了不同溅射时间、不同衬底材质对SnO_2纳米颗粒形成的影响规律。结果表明,溅射时间对SnO_2纳米颗粒的尺寸有显著影响。随溅射时间延长,颗粒尺寸呈线性增长,从约20 nm(1 min)增长到约80 nm(10 min)。衬底材质则对SnO_2纳米颗粒的形态及分布有显著影响。对比单晶硅、载玻片、喷金载玻片三种不同衬底材质,发现以单晶硅为衬底的纳米颗粒分布均匀,而以载玻片为衬底的纳米颗粒分布不均,并且随溅射时间延长,以载玻片为衬底的纳米颗粒发生团聚生长,颗粒粗大。载玻片衬底喷金处理后可使纳米颗粒的形貌及分布得到改善。

SnO2 nanoparticles were prepared by using DC sputtering. The formation mechanism of SnO2 nanoparticles was analyzed and the effects of substrate materials and sputtering time on SnO2 nanoparticles were investigated. The results show that the sputtering time has a significant effect on the size of SnO2 nanoparticles. The particle size increases linearly with the sputtering time, grown from about 20 nm (1 min) to about 80 nm (10 min). Substrate materials mainly affect the morphology and distribution of SnO2 nanoparticles. Compared with monocrystalline silicon, microslide and Au-sprayed microslide three kinds of substrate materials, it is found that nanoparticles have a uniform distribution on monocrystallinesilicon, but a nonuniform distribution on microslide. With the increasing of sputtering time, nanoparticles on microslide would cluster and become coarse. In the case of Au-sprayed microslide, the morphology and distribution of nanoparticles can be obviously improved.