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高质量单层MoS2的APCVD生长及光电性能研究

APCVD Growth and Photoelectric Properties of High Quality Monolayer MoS2
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摘要 单层二硫化钼(MoS2)具有直接带隙和优异的光电性能,在场效应晶体管、太阳能电池、光电探测器和气体传感器等领域有潜在的应用前景。本文采取常压化学气相沉积(APCVD)的方法在SiO2/Si衬底上生长了大尺寸的三角形MoS2纳米片。Raman谱、PL谱和光学衬度谱表明,所生长的MoS2样品为厚度均匀的单层MoS2,且具有较高的晶化质量和良好的发光性能。 Monolayer molybdenum disulfide (MoS2) has potential application potential in Field effect transistors, solar cells, photodetector and gas sensor due to its direct band gap and excellent photoelectric performance. In this paper, large triangular MoS2 nanosheets were grown on SiO2/Si substrate by atmospheric pressure chemical vapor deposition (APCVD). The results of Raman spectrum, PL spectrum and optical contrast spectrum show that the as-grown MoS2 nanosheets are monolayer of uniform thickness with good crystalline quality and good luminous properties.
作者 祝祖送 尹训昌 尤建村 ZHU Zusong;YIN Xunchang;YOU Jiancun(School of Physics & Electrical Engineering,Anqing Normal University,Anqing 246133,China)
出处 《安庆师范大学学报(自然科学版)》 2019年第3期56-59,共4页 Journal of Anqing Normal University(Natural Science Edition)
基金 安徽高校自然科学重点研究项目(KJ2019A0575) 教育部产学合作协同育人项目(201802070102) 安庆师范大学资助项目(2017JYXM034)和安庆师范大学物理与电气工程学院资助项目(Wdxy2018jyxm001)
关键词 二硫化钼 化学气相沉积 晶化质量 均匀性 molybdenum disulfide chemical vapor deposition crystalline quality uniformity
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