基于单路利特罗型光栅干涉仪的超精密位移测量技术研究

Study on Ultra-Precision Displacement Measurement Technique Based on a Single-Path Littrow Grating Interferometer

基于光栅干涉仪的超精密位移测量技术是先进制造领域的关键共性技术,采用更高刻线密度的光栅是提升光栅干涉仪测量精度与分辨率的有效途径。随着电子束制备光栅技术的提升,采用电子束加工高刻线密度光栅(大于3000线/mm)作为测量基准是优化干涉仪性能的有效途径。利用3333线/mm的高刻线密度电子束直写光栅,采用单路利特罗光栅干涉构型,搭建了原始信号周期为300nm的光栅干涉仪,验证了其在位移测量方面的准确性与稳定性。单路利特罗光栅干涉仪与激光干涉仪比对装置为后续光栅间距标定提供了新的可能性,是电子束直写型高刻线密度光栅在精密位移测量领域的有益探索。

Ultra-precision displacement measurement technology,utilizing grating interferometers,is pivotal in the field of advanced manufacturing.Employing gratings with higher line densities is a proven method to enhance the accuracy and resolution of these interferometers.Advances in electron beam lithography for grating fabrication have enabled the use of high line density gratings(exceeding 3000 lines/mm)as measurement standards,significantly optimizing interferometer performance.This research employs a high line density electron beam direct-write grating with 3333 lines/mm in a singlepath Littrow configuration.The interferometer,characterized by a base signal period of 300 nm,showcases its accuracy and stability in displacement measurement.The comparative setup between this single-path Littrow grating interferometer and a laser interferometer opens new avenues for grating pitch calibration.This study marks a valuable exploration in precision displacement measurement using electron beam direct-write high line density gratings.