摘要
我国处在电子和半导体等关键产业升级的快速发展阶段,相关产业配套原材料供给问题一直备受关注。高纯电子级三氟化硼-^(11)B气体是半导体离子注入的关键离子源,在电子产业领域应用广泛。介绍了近几年三氟化硼-^(11)B的国内外发展现状,三氟化硼-^(11)B的合成方法、纯化工艺和各种工艺的优缺点,列举了硼同位素分离技术和检测分析方法。在工业生产中会采取精馏、吸附、化学转化等联合的方法对三氟化硼-^(11)B进行产业化生产,具有一定的参考价值和指导意义。
China is in the rapid development stage of upgrading key industries such as electronics and semiconductors,and the supply of supporting raw materials for related industries has always been highly concerned.High-purity electronic grade boron trifluoride-^(11)B gas is a key ion source for semiconductor ion implantation and has wide applications in the field of electronics.The development status of boron trifluoride-^(11)B at home and abroad in recent years,the preparation methods,purification processes and the advantages and disadvantages of various processes of boron trifluoride-^(11)B are introduced.It also lists boron isotope separation technology and detection analysis methods.In industrial production,joint methods such as distillation,adsorption,and chemical conversion will be adopted to produce boron trifluoride-^(11)B on an industrial scale,which has certain reference value and guiding significance.
作者
付豪
张金彪
郭琼
何红振
铁宁
袁胜芳
FU Hao;ZHANG Jinbiao;GUO Qiong;HE Hongzhen;TIE Ning;YUAN Shengfang(Haohua Gas Co.,Ltd.,Luoyang 471012,China)
出处
《低温与特气》
CAS
2024年第3期1-6,共6页
Low Temperature and Specialty Gases
基金
集成电路电子化学品关键技术研究及产业化(221100230400)。