氧氛围下PLD法沉积纳米金刚石薄膜

Growth of Nanocrystalline Diamond Films by Pulsed Laser Deposition in Oxygen Atmosphere

用固体脉冲激光 (Nd∶YAG)烧蚀石墨靶在镜面αAl2 O3(0 0 0 1)上沉积纳米金刚石薄膜 .用Raman谱、XRD衍射谱和SEM分别对薄膜的成键情况和表面形貌进行了分析 .结果表明 :显微Raman谱出现三个峰包 :115 0cm- 1 、13 5 0cm- 1 、15 80cm- 1 ,分别对应着纳米金刚石特征峰、石墨的D峰和G峰 ;XRD衍射谱在 41.42°出现金刚石的 (10 0 )衍射峰 .实验结果表明 ,影响薄膜生长的关键参数主要是氧气压的大小和衬底的温度 .在氧气压为 6Pa和衬底温度为 5 5 0℃时 ,制备的薄膜质量较好 .

Nanocrystalline diamond (NCD)films were grown using pulsed laser deposition on mirror polished αAl 2 O 3 (0001) substrates at temperature in 550 ℃.Influence of process parameters on the growth mechanism of diamond were studied in gas pressures and substrate temperatures.We characterized the surface morphology and bonding of the deposited film by Raman spectrum , Xray diffraction and scanning electron microscopy.As a result, the surface of thin films by pulsed laser deposition are uniformity and lubricity.The Raman structure of the samples mainly exhibit three features near 1 150 cm -1 ,1 350 cm -1 and 1 580 cm -1 which position are separate corresponding with nanodiamond?graphitic D and G bands in the films.The diffraction peak of diamond(100) is appearance by XRD spectra.The high quality of the film is in the work pressure with 6Pa and the substrate temperature with 550 ℃.We discuss the possible diamond growth mechanism by PLD in an oxygen environment.