摘要
根据集成电路等制作技术不同发展阶段对超净高纯试剂和光刻胶的不同要求,阐述了国内外超净高纯试剂和光刻胶的现状、应用及发展状况等。
The actuality, application and development of ultra-clean and high pure chemicalreagents and photoresists used for the micro-electronic industries in China and in other countriesare reviewed, according to the requests of ultra-clean and high pure chemical reagents and photore-sists for the facture technology of integrate circuit in different fields.
出处
《半导体技术》
CAS
CSCD
北大核心
2003年第12期12-16,21,共6页
Semiconductor Technology
关键词
集成电路
超净高纯试剂
光刻胶
现状
电子化工材料
ultra-clean and high pure chemical reagents
photoresists
actuality
development