摘要
介绍了基于速度调制技术的均匀软X射线多层膜制备方法,并采用该方法在直径为150mm的平面硅基板上制备出Mo/Si多层膜,其中心波长为13.5nm,膜厚空间非均匀性优于1%,较转盘匀速溅射方法制备的多层膜膜厚空间均匀性提高了近6倍。
A uniform soft Xray multiplayers deposition technology is introduced in this paper, in which the platter revolution speed is varied as a function of its position relative to the sputtering source. Using this method, the relative thickness variation of the Mo/Si multilayers with central wavelength of 13.5nm was reduced from 7% to 1% peaktovalley over 150mm diameter region on flat Si substrates.
出处
《强激光与粒子束》
EI
CAS
CSCD
北大核心
2003年第5期444-446,共3页
High Power Laser and Particle Beams
基金
国家自然科学基金重点资助课题(69938020)
中国科学院创新基金资助课题
关键词
软X射线
多层膜
磁控溅射
均匀性
Soft X-ray
Multilayer coatings
Magnetron sputter
Uniformity
