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p沟道锗/硅异质纳米结构MOSFET存储器及其逻辑阵列 被引量:2

p-Channel Ge/Si Hetero-Nanocrystal Based MOSFET Memoryand Its Logic Array
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摘要 采用巴丁 (Bardeen)传输哈密顿方法 ,数值计算了 p沟道锗 /硅异质纳米结构存储器的时间特性 .由于台阶状隧穿势垒和较高价带带边的作用 ,这种新型的存储器单元可以同时实现器件的快速编程和长久存储 ,具有优异的存储特性 .以 2× 2逻辑阵列为例说明了这类存储器单元组成逻辑电路的设计原理 .研究结果表明 :这种器件可以作为在室温下工作的性能优异的非易失性存储器单元 ,有望在将来的超大规模集成电路中获得应用 . Basing on Bardeen's transfer Hamiltonian formalism,the charge storage characteristics of p-channel Ge/Si hetero-nanocrystal based MOSFET memory is simulated.Owing to the advantages of a compound potential well and a higher offset in the valence band,this kind of memory can possess the advantages of both high-speed programming and long retention simultaneously,and thus it has the well storage characteristics.Furthermore,a 2×2 logical array is used to illustrate the principle of logical.Therefore,this kind of device,as an excellent nonvolatile memory operating at room temperature,is desired for the applications in the future VLSI.
出处 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2004年第2期179-184,共6页 半导体学报(英文版)
基金 国家重点基础研究专项经费 (批准号 :G0 0 1CB3 0 9) 国家自然科学基金 (批准号 :90 10 10 2 1 60 2 3 60 10 )资助项目~~
关键词 锗/硅 异质纳米结构 存储器 空穴隧穿 数值模拟 Ge/Si hetero-nanocrystal memory hole tunneling simulation
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