钽件专用离子渗氮设备研制

Research and Manufacture of Ion-Nitriding Equipment for Tantalum Parts

针对精密钽制零件表面渗氮的特殊要求 ,通过炉内阴极面积可调的结构设计 ,研制了温度可达 85 0℃ ,压升率低于 0 0 0 4 5Pa/min的钽专用离子渗氮炉。将阴极分成若干独立部分 ,单独将某些部分接入负偏压用作辅助阴极 ,也可将其中某些部分接入零电位用作辅助阳极 ,也可保持悬浮电位 ,只用作隔热屏 ,将等离子体参数和温度、阴极电流和电压施行独立调控。通过工艺试验 ,成功地实现了精密钽件的离子渗氮 ,获得了高硬度、低粗糙度的渗氮层。

The special ion-nitrding equipment for tantalum parts was manufactured with the proper design of cathode structure to meet the special needs of tantalum nitriding.The cathode of the equipment was divided into several separate units,some of which can be imposed minus voltage,zero voltage or suspended voltage respectively as auxiliary cathode,auxiliary anode or simply heat-insulating plate,so that the plasma parameters,temperature,cathode current and voltage can be separately modulated according to the technical requirements.The equipment can be heated to more than 850℃ and the leakage is less than 0.0045Pa/min.The ion-nitriding of tantalum parts was carried out in this equipment and nitriding layers of tantalum with high hardness and low roughness were obtained.