电感耦合等离子体源的研究进展

Research Progress on Inductively Coupled Plasma Source

在简要回顾传统高密度等离子体源的基础上,重点介绍了新一代的低温高密度等离子体——电感耦合等离子体源(ICP)的放电机理,并结合最近的研究进展,系统分析了ICP的性能影响因素,总结了ICP目前存在的问题,展望了其应用前景。

Low Temperature High Density(LTHD) plasma have attracted much attentions in recent years due to its extensive applications for deposition of the large area films and etching of the integrated circuits.Several traditional LTHD plasma sources were reviewed,a new generation of LTHD plasma named Inductively Coupled Plasma(ICP) was emphatically introduced,including its principle and the influencing factors on the performance based on last research results.Finally,the existent problems about ICP were summarized and its applications were prospected.