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SiO_2/Si波导应力双折射数值分析 被引量:3

Numerical Analysis for a SiO_2/Si Waveguide Stress-Birefringence
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摘要 采用有限元法对SiO2/Si掩埋光波导制备工艺中的应力变化进行了系统的分析,在此基础上,应用有限差分束传播法(FDBPM)对应力光波导的双折射进行了计算.结果表明上包层的玻璃化过程是SiO2/Si波导形成水平方向和垂直方向应力差的主要原因,相应的应力双折射系数B在10-4量级.进一步的分析表明上包层B,P重掺杂可明显减小波导的双折射系数. The stress distribution of a SiO2/Si waveguide during different sintering step is analyzed theoretically using the finite element method. At the same time,the birefringence of the waveguide is also analyzed by the finite difference beam propagation method (FDBPM). The results show that the reasoning for the formation of the stress difference between the horizontal and vertical direction lies mainly in the overcladding sintering. The corresponding birefringence index is about 10^-4 ,which can be effectively reduced by depositing rich B and P in the overcladding.
出处 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2005年第7期1454-1458,共5页 半导体学报(英文版)
基金 国家重点基础研究发展规划(批准号:G2000036602) 国家自然科学基金(批准号:69889701)资助项目~~
关键词 SIO2/SI 波导 应力 双折射 数值分析 SiO2/Si waveguide stress birefringence numerical analysis
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参考文献8

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