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Multilayer optics for the EUV and soft X-rays 被引量:4

Multilayer optics for the EUV and soft X-rays
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摘要 The demand to enhance the optical resolution, to structure and observe ever smaller details, has pushed the way towards the EUV and soft X-rays. Induced mainly by the production of more powerful electronic circuits with the aid of projection lithography, optics developments in recent years can be characterized by the use of electromagnetic radiation with smaller wavelength. The good prospects of the EUV and soft X-rays for next generation lithography systems (λ=13.5 nm), microscopy in the “water window” (λ=2.3~4.4 nm), astronomy (λ=5~31 nm), spectroscopy, plasma diagnostics and EUV/soft X-ray laser research have led to considerable progress in the development of different multilayer optics. Since optical systems in the EUV/soft X-ray spectral region consist of several mirror elements a maximum reflectivity of each multilayer is essential for a high throughput. This paper covers recent results of the enhanced spectral behavior of Mo/Si, Cr/Sc and Sc/Si multilayer optics. The demand to enhance the optical resolution, to structure and observe ever smaller details, has pushed the way towards the EUV and soft X-rays. Induced mainly by the production of more powerful electronic circuits with the aid of projection lithography, optics developments in recent years can be characterized by the use of electromagnetic radiation with smaller wavelength. The good prospects of the EUV and soft X-rays for next generation lithography systems (λ=13.5 nm), microscopy in the “water window” (λ=2.3-4.4 nm), astronomy (λ=5-31 nm), spectroscopy, plasma diagnostics and EUV/soft X-ray laser research have led to considerable progress in the development of different multilayer optics. Since optical systems in the EUV/soft X-ray spectral region consist of several mirror elements a maximum reflectivity of each multilayer is essential for a high throughput. This paper covers recent results of the enhanced spectral behavior of Mo/Si, Cr/Sc and Sc/Si multilayer optics.
出处 《光学精密工程》 EI CAS CSCD 北大核心 2005年第4期421-429,共9页 Optics and Precision Engineering
关键词 EUV X射线 多层膜 光学涂覆技术 MO/SI Cr/Sc Sc/Si 光电子技术 Mo/Si Cr/Sc Sc/Si optics multilayer mirror magnetron sputtering EUV soft X-ray
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  • 1D.Attwood.Soft X-rays and extreme ultraviolet radiation: principles and applications[M].Cambridge University Press,2000.
  • 2E.A.Dobisz (Edt.).Emerging lithographic technologies V[J].Proc.SPIE,2001,4343:810.
  • 3K.Bergmann,G.Schriever,O.Rosier,M.Müller,W.Neff,R.Lebert.Highly repetitive,extreme ultraviolet radiation source based on a gas-discharge plasma[J].Appl.Opt.,1999,38:5413-5417.
  • 4I.V.Kozhevnikov,I.N.Bukreeva,E.Ziegler.Design of X-ray supermirrors[J].Nucl.Instr.Meth.Phys.Res.A,2001,460:424- 443.
  • 5P.Bni.Supermirror-based beam devices[J].Physica,1997,B234-236:1038-1043.
  • 6K.D.Joensen,P.Voutov,A.Szentgyorgyi,J.Roll,P.Gorenstein,P.Hoghoj,F.E.Christensen.Design of grazing incidence multilayer supermirrors for hard X-ray reflectors[J].Appl.Optics,1995,34:7935-7944.
  • 7Z.Wang,J.Cao,A.G.Michette.Depth-graded multilayer X-ray optics with broad angular response[J].Optics Communications,2000,177:25-32.
  • 8V.V.Protopov,V.A.Kalnov.X-ray multilayer mirrors with an extended angular range[J].Optics Communications,1998,158:127-140.
  • 9B.L.Henke,E.M.Gullikson,J.C.Davis.X-ray interactions: photoabsorption,scattering,transmission,and reflection at E=50-30000 eV,Z=1~92[J].Atomic Data and Nuclear Data Tables,1993,54(2):181-342.
  • 10J.Thieme,G.Schmahl,D.Rudolph,E.Umbach,et al.X-Ray microscopy and spectromicroscopy[C].Springer Verlag,1998.

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