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工作波长短于10nm的软X射线多层膜 被引量:2

Soft X-Ray Multilayers at Wavelengths below 10nm
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摘要 本文对工作波长短于10nm的软X射线多层膜正入射反射镜的国内外现状作了简单的介绍和分析,给出选择多层膜材料的一些原则,并结合本组情况选择了Ru/B4C、Rh/B4C和MO/B4C三种材料组,在波长8.0nm附近设计并计算出多层膜的结构和反射率等性能参数。 This paper introduces the soft X--ray multilayers at wavelengths below 10um andsummaries some rules of selecting the multilayer meterials. We design the Ru/B4C.Rh/B4Cand Mo/B4C multilayers for sum wavelength at normal incidence, and give the idealreflectivities of 38%--50%. The effect of thickness control error as well surface--interfaceroughness is also discussed. These will be use fill in next research of fabrication procedure.
出处 《光学精密工程》 EI CAS CSCD 1996年第2期19-24,共6页 Optics and Precision Engineering
基金 国家自然科学基金
关键词 软X射线 多层膜 反射镜 正入射 膜系 Soft X-ray, Multilayer mirrors, Normal incidence, Multilayer design and simulation
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参考文献2

  • 1张俊平,光学学报,1995年,8卷,1088页
  • 2曹健林,中国激光,1995年,3卷,465页

同被引文献19

  • 1朱勇,沈伟东,叶辉,顾培夫.磁控反应溅射SiN_x薄膜的研究[J].光子学报,2005,34(1):154-157. 被引量:15
  • 2蔡长龙,刁东风,三宅正司,松本武.基片偏压对MCECR溅射硬碳膜特性的影响[J].光子学报,2005,34(5):734-736. 被引量:2
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