通过制备Ti/TiC和Si/Si_xN_y过渡层在铜基体上沉积类金刚石膜的研究

Studies of Diamond-like Carbon Films Deposited on Copper Substrate With Ti/TiC and Si/Si_xN_y Intermediate Layers

将磁控溅射物理气相沉积(MS-PVD)和电子回旋共振-微波等离子体增强化学气相沉积(ECR-PECVD)技术相结合,在铜基体上通过制备两种不同的过渡层,成功地沉积了类金刚石膜。拉曼光谱结果分析表明,所制备的碳膜都具有典型的类金刚石结构特征。通过原子力显微镜对薄膜的微观形貌进行分析,采用纳米压痕测量薄膜的硬度和模量。并对Ti/TiC过渡层和Si/SixNy过渡层上沉积的类金刚石薄膜进行了研究对比。

Diamond-like carbon （DLC） films were grown on copper substrate coated with an intermediate layer by magneto-sputtering physical vapor deposition （MS-PVD） and by microwave electron cyclotron resonance （MW-ECR） plasma enhanced chemical vapor deposition （PECVD）. Raman spectroscopy result indicates that the films show an amorphous structure and typical characteristics of DLC films. The morphology of DLC was characterized by atomic force microscopy （AFM） and the hardness and modulus were analyzed by nanoindentation. The difference of DLC films deposited on copper substrate with Ti/TiC and Si/SixNy intermediate layers was discussed.