摘要
以厚度为25~70mm的钛箔为衬底,直流磁控溅射法制备0.8~1.2mm的底电极Mo薄膜,而后以CuIn和CuGa靶交替溅射制得Cu-In-Ga金属预制膜,再以真空硒化法制得CuIn1-xGaxSe2薄膜。以化学浴沉积法制备缓冲层CdS,射频磁控溅射法制备ZnO和ZAO,直流磁控溅射法制备上电极,制得结构为衬底Ti/Mo/CIGS/CdS/ZnO/ZAO/Al,其光电转换效率达到7.3%(25℃,AM0)。
CuIn1-xGaxSe2 thin film solar cells were preparatived on 27-70 μm thick Ti foils flexible substrates. A 0.8-1.2 μm molybdenum(Mo) layer was deposited by DC magnetron sputtering, which served as the back contact. The CIGS absorbing layers were grown by the two-step method. Cu-In-Ga metallic precursors were deposited using Cu-Ga and Cu-In alloy targets by DC magnetron sputtering. The metallic precursor films were selenized in vacuum evaporation system. Intrinsic-ZnO and Al-doped ZnO were deposited by ratio-frequency (RF) sputtering on CBD CdS devices, and the AI top contact was deposited by DC magnetron sputtering. The efficiency of CIGS-based solar cells with the structure of Ti/Mo/CIG S/CdS/ZnO/ZAO/Al is about 7.3% (test condition: AM0, 25 ℃).
出处
《电源技术》
CAS
CSCD
北大核心
2009年第5期406-408,共3页
Chinese Journal of Power Sources
基金
天津市科技支撑计划重点项目(07ZCKFGX02700)
关键词
铜铟镓硒
薄膜
太阳电池
柔性
CuIn1-x GaxSe2
solar cell
thin film
flexible