电弧离子镀TiN TiAlN薄膜的制备及高温退火研究

A Study of High Temperature Oxidation of the Arc like Ion Plated TiN and TiAlN Films

利用电弧离子镀技术在不锈钢衬底上沉积了ＴｉＮ，ＴｉＡｌＮ薄膜，并对两种样品分别在大气环境下进行了高温退火．退火前后都做了Ｘ射线衍射（ＸＲＤ）谱及硬度测量，发现退火后ＴｉＡｌＮ薄膜表面出现Ａｌ２Ｏ３层，该层的出现使ＴｉＡｌＮ薄膜的高温特性大大好于ＴｉＮ涂层，在机械工业中将会有广泛的应用前景．

TiN and TiAlN are deposited onto a substrate of stainless steel in an arc like ion plating apparatus. The high temperature oxidation of these films was carried at temperatures ranging from 973 ～1 173 k for half an hour in air. The hardness and XRD of these films are measured before and after high temperature oxidation. It is found that the hardness of the layers decreased after oxidation because the oxide layers are formed. It is also found that the characteristic of oxidation resistance of TiAlN is better than that of TiN. It is suggested that the Al element in TiAlN film reacts with O in the oxidation process and forms Al 2O 3. This layer can improve the stability of TiAlN film at high temperatures. The activation energy of oxidation of TiAlN film is greater than that of TiN film.