下底层Ti引导制备Co-Pt垂直磁记录薄膜的研究

Co-Pt Perpendicular Magnetic Recording Film Induced by Ti Underlayer

在加热的玻璃基板上,通过磁控溅射的方法沉积金属Ti作为下底层,然后沉积不同成分的Co1-x-Ptx(x=0,15%,26%,35%)磁性薄膜.利用振动样品磁强计(VSM)和X射线衍射技术(XRD)分析了薄膜的磁性能和晶体结构.结果表明Pt原子分数对Co-Pt晶格常数有重要影响,随着Pt原子分数的增加,Co晶格常数(a,c)增大,从而减小Co-Pt与下底层Ti在(00.2)晶面之间的错配度,有利于c轴取向垂直膜面排列,获得了较好的磁性能.引入Ti和SiO2共溅射制备下底层,研究发现随着SiO2体积分数的增加,Co-Pt薄膜的垂直磁性能得到改善.

The magnetic Co1-x-Ptx thin films with different Pt atom fractions（x：0,15%,26%,35%）were deposited on the Ti underlayer which was deposited first on the glass substrate heated at 300？℃ by DC magnetron sputtering.The crystal structure and magnetic properties of the films were investigated by XRD and VSM,respectively.The results showed that the Pt atom fraction affects greatly the lattice constants of Co-Pt.With the increasing Pt atom fraction,the lattice constants of Co（a,c）increase,thus reducing the lattice mismatching between Co-Pt and Ti underlayer on the（00.2）crystal plane and benefiting the c-axis orientation to be perpendicular to the film surface.In this way the better magnetic properties can be obtained.With the co-sputtering process of Ti and SiO2 introduced to prepare the underlayer,it was found that the perpendicular magnetic properties of Co-Pt film can be improved with increasing SiO2 volume fraction.