摘要
采用Ti靶电弧离子镀与Al靶中频磁控溅射相结合的复合工艺,通过调节Al靶电流,在不锈钢基体上制备了TiN薄膜和TiAlN薄膜样品,并在热处理炉内对薄膜进行高温抗氧化试验,分析了薄膜氧化前后的表面形貌、断口形貌及显微硬度。结果表明:TiAlN薄膜氧化前和氧化后的硬度均随着铝靶磁控溅射电流的增强、铝含量的提高而增加;TiAlN薄膜的高温稳定性明显优于TiN薄膜;TiAlN薄膜经800℃氧化后发生膨胀而变得疏松,内部发生了柱状晶化,致密性下降。
The TiAlN and TiN films deposited on polished face of stainless steel by arc ion plating compounded with intermediate frequency unbalanced magnetron sputtering were oxidized at different temperature in heat treatment furnace.The investigation of microstruction,crystalline structure and micro-hardness after oxidant films was carried out.The experiment results show that the hardness of TiAlN films before and after oxidation increases with the enhance of Al target electric current density and the increase of Al content;The high temperature stability of TiAlN films superior to TiN films;The TiAlN films become expansion after 800 ℃ oxidation.This will decrease the compactness of TiAlN films.
出处
《表面技术》
EI
CAS
CSCD
北大核心
2010年第6期22-25,共4页
Surface Technology
基金
福建省教育厅A类科技项目基金资助(JA07205)
关键词
TIALN薄膜
TIN薄膜
抗高温氧化性能
中频磁控溅射
电弧离子镀
TiAlN films
TiN films
thermal anti-oxidation property
intermediate frequency unbalanced magnetron sputtering
arc ion plating