摘要
Diamond like carbon thin film is successfully deposited on silicon, titanium and stainless steel substrate at low temperature in a filtered vacuum arc deposition system. Arc discharges are established on a graphite cathode in the system with a toroidal macroparticle filter. A cathode activating magnetic field and a filtered magnetic field to collimate the plasma beam are applied. Ion current convected by the plasma beam is measured with a negatively biased probe. It is shown that the magnetic field of the coils located on the plasma duct has a strong influence on cathode spot behavior. Orthogonally the designed experiments are carried out to optimize the deposition parameters of arc stability. Finally, the diamond like carbon thin films are studied by scanning electron microscope (SEM) and Raman spectrum.
详细介绍了过滤式阴极电弧沉积设备，并研究了磁场对电弧稳定性的影响。采用正交实验研究了电弧稳定的优化参数。对所获得的类金刚石薄膜进行了扫描电镜和喇曼光谱测试，表明ｓｐ３含量达到６９％。
