TiAlN/TiN纳米多层膜的微结构与力学性能

Microstructures and Mechanical Properties of TiAlN/TiN Nano-Multilayered Films

采用多靶反应磁控溅射制备了一系列TiAlN层厚固定,TiN层厚在一定范围内连续变化的不同调制结构的TiAlN/TiN纳米多层膜,并使用X射线衍射分析、扫描电子显微镜、纳米压痕仪和CETR-UMT-3型多功能摩擦磨损试验机对多层膜的微观结构和力学性能进行了表征和分析。研究结果表明:TiAlN/TiN纳米多层膜形成了周期性良好的成分调制结构,其中TiN层的插入并没有打断TiAlN层的柱状晶生长。在一定的调制周期下,TiN层和TiAlN层能够形成共格外延生长结构,多层膜呈现硬度异常升高的超硬效应,当TiN层厚约为1.6 nm时多层膜的硬度达到最大值50 GPa,并具有相比于TiAlN单层膜更低的摩擦系数。进一步增加TiN层厚,由于多层膜共格界面结构的破坏,多层膜的硬度随之降低。

The TiAlN / TiN nano-multilayered coatings were prepared by reactive magnetron sputtering on substrates of Si（ 100） and stainless steel. The effect of the thickness of TiN insertion layer on the microstructures and mechanical properties of the multilayers was characterized with X-ray diffraction,scanning electron microscopy,nano-indentation and CETR-UMT-3 tribometer. The results show that the TiN-layer thickness significantly affects the mechanical behavior and epitaxial growth of the TiAlN / TiN multilayer. For example,a critical thickness of the TiN layer was found to be 16 nm; below 16 nm,the well-defined,compositional modulated epitaxial TiAlN / TiN multilayers with columnar grains were deposited. As the thickness increased to 1. 6 nm,the hardness of the TiAlN / TiN multilayers rapidly increased to the maximum of 50 GPa with a friction coefficient being lower than that of TiAlN coatings. However,as the thickness increased above 1. 6 nm,the hardness slowly decreased,possibly because the epitaxial growth of the TiAlN / TiN multilayers was blocked.