多弧离子镀制备TiN/TiAlN多层薄膜性能研究

Study on properties of TiN/TiAlN multi-layer film deposited by multi-arc ion plating method

采用多弧离子镀技术选取钛靶电流分别为60A、70A、80A和基体偏压分别为-240V、-300V、-360V在高速钢基体上制备Ti N/Ti Al N多层薄膜。使用划痕仪、显微硬度计、摩擦磨损试验机和马弗炉对膜层的膜基结合力、显微硬度、摩擦磨损性能和热震性能进行检测。结果表明:在钛靶电流为70A和基体偏压为-240V时膜基结合力最高,同时显微硬度也较高;在基体偏压为-300V的条件下,钛靶电流为70A时的摩擦系数最小,其耐磨性能良好;基体偏压为-240V时的抗热震性能良好。

TiN/TiAlN multi-layer film was deposited on high speed steel by multi-arc ion plating technology. The samples were made by Ti target current of 60A, 70A and 80A, and substrate bias voltage of-240V,-300V and -360V. The adhesion strength, micro-hardness, friction and wear properties and thermal shock resistance of the film were checked up by scratch tester,micro-hardness tester, friction wear tester and muffle furnace. The results respectively show that the adhesion strength and the micro-hardness of the film are higher with 70A Ti target current and -240V substrate bias voltage. Under the condition of -300V substrate bias voltage, the friction coefficient is small and the wear-resisting property is well with 70A Ti target current. The thermal shock resistance is well with the -240 V substrate bias voltage.