复合氮化合物薄膜的研究

Research of Compound Nitrogen Compound Thin Film

采用多源PVD技术在YG8硬质合金基体上分别沉积了Ti N和Ti NX薄膜,利用X射线衍射仪、扫描电子显微镜以及多功能材料表面试验仪,研究了多种元素的添加对Ti N涂层微观结构、断口和表面形貌的影响。结果表明:添加多种元素可使Ti N涂层的微观结构发生明显变化,能有效控制膜的结晶和生长模式,改变传统的(111)面的单一取向,从原来的(111)的择优取向,转变为(200)、(111)、(220)共同取向;Ti NX涂层的断口呈非柱状结构,表面粗糙度小于Ti N,具有更为均匀致密的结晶结构和光整的表面形貌,趋于Ti Al N薄膜的显微硬度,一致的结晶组织结构、有效的沉积效率、良好的膜基结合力有利于厚膜Ti N的制备;相对于Ti N,寿命可提高50%-100%。

using multi-source PVD technology in YG8 cemented carbide substrate on the TiN and TiNx thin film dep- osition, respectively, using X-ray diffraction, scanning electron microscope and muhifunctional material surface test, studied the various elements to add to the TiN coating microstructure, fracture surface and the influence of surface topography. Re- suits show that the various elements to add the TiN coating microstructure changed obviously,which can effectively control the crystallization of membrane, growth pattern, changing the traditional single orientation （ 111 ）, from the original （ 111 ） preferred orientation, into a （ 200）, （ 111 ）, （220） orientation ; TiNx fracture in the columnar structure of coating, the surface roughness is less than the TiN;Its crystalline structure is more uniform and dense, finishing surface morphology, tend the microhardness of TiA1N film, consistent with the crystal structure, effective deposition efficiency, good film adhesion, and is conducive to the preparation of thick film TiN. Life can be increased by 50% - 100% ,relative to the TiN ,good stability.