原子层沉积技术发展概况

Development of atomic layer deposition technology

主要介绍了原子层沉积技术的历史背景、原理(包括两种自限制的反应机制、前驱体的要求与分类)以及原子层沉积本身作为一种涂层制备技术的特征和优势。重点叙述了近年来原子层沉积技术在设备和工艺方面的发展状况和最新研究成果。最后,对原子层沉积技术的发展与前景分别进行了总结和展望。

This paper reviews the historical background, principle（including two self-limiting ways, requirements and classification of precursor）of ALD as well as the characteristics and advantages of ALD as a technology itself. The development status of ALD technology and the latest research results are mainly addressed.Finally, the development and prospect of ALD are summarized and prospected, respectively.